Quantum atomic lithography via cross-cavity optical Stern-Gerlach setup (2014)
Source: Journal of the Optical Society of America B. Unidade: IFSC
Subjects: ÓPTICA, ELETRODINÂMICA, LITOGRAFIA (GRAVURA)
ABNT
MÁXIMO, C. E. et al. Quantum atomic lithography via cross-cavity optical Stern-Gerlach setup. Journal of the Optical Society of America B, v. 31, n. 10, p. 2480-2484, 2014Tradução . . Disponível em: https://doi.org/10.1364/JOSAB.31.002480. Acesso em: 30 abr. 2024.APA
Máximo, C. E., Batalhão, T. B., Bachelard, R., Moraes Neto, G. D., Ponte, M. A., & Moussa, M. H. Y. (2014). Quantum atomic lithography via cross-cavity optical Stern-Gerlach setup. Journal of the Optical Society of America B, 31( 10), 2480-2484. doi:10.1364/JOSAB.31.002480NLM
Máximo CE, Batalhão TB, Bachelard R, Moraes Neto GD, Ponte MA, Moussa MHY. Quantum atomic lithography via cross-cavity optical Stern-Gerlach setup [Internet]. Journal of the Optical Society of America B. 2014 ; 31( 10): 2480-2484.[citado 2024 abr. 30 ] Available from: https://doi.org/10.1364/JOSAB.31.002480Vancouver
Máximo CE, Batalhão TB, Bachelard R, Moraes Neto GD, Ponte MA, Moussa MHY. Quantum atomic lithography via cross-cavity optical Stern-Gerlach setup [Internet]. Journal of the Optical Society of America B. 2014 ; 31( 10): 2480-2484.[citado 2024 abr. 30 ] Available from: https://doi.org/10.1364/JOSAB.31.002480